Title of article
Structure of nitride film hard coatings prepared by reactive magnetron sputtering
Author/Authors
R. Manaila، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 1998
Pages
10
From page
1
To page
10
Abstract
TiN, Ti1yxAlxN and ZrN films were deposited by electron-beam- assisted dc magnetron sputtering. X-ray diffraction
showed different degrees of texture, depending on substrate bias, temperature and composition. In TiN films deposited with
a high bias, microstructure changes were evidenced from lattice parameter trends, attributable to Ar inclusions. Ti1yxAlxN
cubic solid solutions showed an average xs0.10. In ZrN films, a rhombohedrally-distorted phase is present, besides the
cubic one. q1998 Elsevier Science B.V. All rights reserved.
Keywords
TIN , ZrN , Reactive magnetron sputtering
Journal title
Applied Surface Science
Serial Year
1998
Journal title
Applied Surface Science
Record number
992760
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