Deposition of Teflon-polymer thin films by synchrotron radiation photodecomposition

Thin films of Teflon-polymers such as PTFE polytetrafluoroethylene., FEP polytetrafluoroethylene-co-hexafluoro-pro- pylene.and PFA polytetrafluoroethylene-co-perluoroalkoxy vinyl ether. were deposited on Si 100. substrates by syn- chrotron radiation the critical wavelength of 1.5 nm.etching of their corresponding starting materials in vacuo. Analysis of the deposited films has been carried out with X-ray photoelectron spectroscopy XPS., Fourier transfer infrared FTIR. spectroscopy as well as X-ray diffraction XRD.and their surface morphologies were observed under scanning electron microscopy SEM.. For the deposition of the Teflon-polymer films, the processing with the synchrotron radiation photo-etching was compared with that using laser ablation and significant differences between them are discussed. q1999 Elsevier Science B.V. All rights reserved.