On the growth of LiF films by Pulsed Laser Deposition

The production of Lithium fluoride LiF.films by Pulsed Laser Deposition is reported for the first time. The influence of several deposition parameters such as the laser energy density, the presence of a gas pressure 10y1 mbar of He. and the substrate temperature on the film quality is studied by using in-situ reflectivity measurements, Scanning Electron Microscopy and X-ray diffraction. Films deposited in vacuum are polycrystalline and fully textured along the 100: orientation, whereas those grown in He pressure present a more complicated structure. Films are generally rough, the roughness decreasing as the substrate temperature increases or the laser energy density decreases. The origin of this roughness is discussed in terms of the ablation mechanism taking place at the target. q1999 Elsevier Science B.V. All rights reserved.