Title of article
Adsorbate-induced faceting of high-index semiconductor surfaces: antimony adsorbed on Ge 103/
Author/Authors
G. Falkenberg، نويسنده , , R.L. Johnson، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 1999
Pages
7
From page
81
To page
87
Abstract
Scanning tunneling microscopy, low-energy electron diffraction and reflection high-energy electron diffraction were used
to monitor changes in the morphology of Ge 103. surfaces after adsorption of antimony and annealing at different
temperatures for various durations. After deposition of Sb at room temperature, the Sb-covered Ge 103.surface breaks up on
annealing into small irregular pyramids, which coalesce and form more regular quasi-one-dimensional ‘hill-and-valley’
structures bounded by reconstructed 1134facets. The average periodicity of the structures approaches a constant maximum
value in the nanometer range. The symmetry of the substrate with respect to the facets constrains the formation of single
domain nanostructures. q1999 Elsevier Science B.V. All rights reserved.
Keywords
Scanning tunneling microscopy , Solid phase epitaxy , Surface structure , morphology , roughness and topography , Antimony , Faceting , Ge 103. , Chemisorption , High index single crystal surface , Low-energy electron diffraction LEED. , Reflection high-energy electron diffraction RHEED.
Journal title
Applied Surface Science
Serial Year
1999
Journal title
Applied Surface Science
Record number
995270
Link To Document