Title of article
Local charge redistribution at potassium adsorption on the Si 111/7=7 surface: a scanning tunneling microscopy study
Author/Authors
A. Watanabe )، نويسنده , , M. Naitoh، نويسنده , , S. Nishigaki، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 1999
Pages
6
From page
548
To page
553
Abstract
The adsorption process of potassium on the Si 111.7=7 surface has been studied by scanning tunneling microscopy
STM.. The adsorption of K proceeds in two stages. In the first stage K atoms adsorb ionically with their s-states above EF
and the charge transfer occurs efficiently on the faulted halves. The first adlayer develops to the entire faulted and unfaulted
regions with the K-induced states above EF. At higher coverages the second stage., K atoms tend to form neutral clusters
preferentially in faulted regions. The electronic structure around the clusters is markedly modified, which suggests a local
charge redistribution. The STM observations well explain measured work function variation. q1999 Elsevier Science B.V.
All rights reserved.
Keywords
Scanning tunneling microscopy , Surface electronic structure , adsorption , potassium , Silicon
Journal title
Applied Surface Science
Serial Year
1999
Journal title
Applied Surface Science
Record number
995529
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