• Title of article

    Local charge redistribution at potassium adsorption on the Si 111/7=7 surface: a scanning tunneling microscopy study

  • Author/Authors

    A. Watanabe )، نويسنده , , M. Naitoh، نويسنده , , S. Nishigaki، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 1999
  • Pages
    6
  • From page
    548
  • To page
    553
  • Abstract
    The adsorption process of potassium on the Si 111.7=7 surface has been studied by scanning tunneling microscopy STM.. The adsorption of K proceeds in two stages. In the first stage K atoms adsorb ionically with their s-states above EF and the charge transfer occurs efficiently on the faulted halves. The first adlayer develops to the entire faulted and unfaulted regions with the K-induced states above EF. At higher coverages the second stage., K atoms tend to form neutral clusters preferentially in faulted regions. The electronic structure around the clusters is markedly modified, which suggests a local charge redistribution. The STM observations well explain measured work function variation. q1999 Elsevier Science B.V. All rights reserved.
  • Keywords
    Scanning tunneling microscopy , Surface electronic structure , adsorption , potassium , Silicon
  • Journal title
    Applied Surface Science
  • Serial Year
    1999
  • Journal title
    Applied Surface Science
  • Record number

    995529