Title of article
Production of large metallic clusters by thermal evaporation
Author/Authors
O. Buiu، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 1999
Pages
4
From page
668
To page
671
Abstract
Cluster beam evaporation has been used to produce metallic and semiconductor thin films for microelectronic
applications. Previous work showed that the deposition of large clusters of antimony )Sb2000.onto silicon substrates and
carbon films can be performed by thermal evaporation through a nozzle orifice and has been modelled using molecular
diffusion theory. The results here show that the model can be extended to include other metals e.g., Ag.. TEM shows that
cluster sizes in the case of Ag are much smaller than for Sb, having a di-similar statistical spread. Photoluminescence of Mg,
Sb and Ag films show decreasing PL intensity with temperature which correlates with the expected concentration of clusters.
q1999 Elsevier Science B.V. All rights reserved
Keywords
production , Large metallic clusters , Thermal evaporation
Journal title
Applied Surface Science
Serial Year
1999
Journal title
Applied Surface Science
Record number
995552
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