Title of article
Field emission characteristics of phosphorus-doped homoepitaxial diamond films
Author/Authors
Chiharu Kimura، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 1999
Pages
4
From page
295
To page
298
Abstract
Field emission characteristics were measured for phosphorous-doped homoepitaxial diamond films grown by microwave
plasma assisted chemical vapor deposition. A variation in the turn-on voltage with cathode metals and various temperatures
is observed for the sample with high electrical resistivity. This behavior of the turn-on voltage demonstrates that the internal
electron emission at the diamondrmetal contact influences field emission characteristics. A reduction in the turn-on voltage
is found for the diamond film with low electrical resistivity. q1999 Elsevier Science B.V. All rights reserved.
Keywords
Diamondrmetal contact , Internal electron emission , Phosphorous doping , Field emission , Homoepitaxial diamond
Journal title
Applied Surface Science
Serial Year
1999
Journal title
Applied Surface Science
Record number
995613
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