Title of article
Effect of thermal annealing on the optical properties of Liq-implanted GaAs
Author/Authors
Y.T. Oh، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 1999
Pages
5
From page
114
To page
118
Abstract
Photoreflectance PR.and Raman scattering measurements were carried out in order to investigate the donor compensation
effects of Liq-implanted and annealed GaAs. As the energy of the Liq-implantation increased, the oscillation period of
the PR spectrum was shorten because of a decrement in the surface electric field resulting from the compensation of donors
due to Ga vacancy, which was also confirmed by the Hall effect measurements. The donor pagination as a function of the
Liq injected energy was explained using the concept of the kinetic energy. While the intensities of the PR spectra increased
remarkably after annealing the period of the Franz–Keldysh oscillation did not change. The intensity of the longitudinal
optical phonon of the Raman spectra increased after annealing. These results indicate that the surface electric field of the
GaAs decreases due to the donor compensation resulting from an increase in the Liq injection energy and that the
crystallinity recovers after thermal annealing. q1999 Elsevier Science B.V. All rights reserved.
Keywords
Liq–GaAs Thermal annealing , Optical properties
Journal title
Applied Surface Science
Serial Year
1999
Journal title
Applied Surface Science
Record number
995646
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