Growth of carbonrnickel multilayer for X-ray–UV optics by RF reactive magnetron sputtering

Amorphous CrNi superlattice films designed as normal-incidence reflector for 5 nm have been grown on float-glass substrates by magnetron sputter deposition in Ar discharge. A comprehensive set of characterization techniques has been applied: grazing X-ray reflection 0.154 nm., atomic force microscopy and transmission electron microscopy in order to determine the quality of the structure. By comparing the results, it could be concluded that RF-magnetron sputtering technique is a good choice for growing such layered synthetic microstructures. q1999 Elsevier Science B.V. All rights reserved.