Oxygen containing silicon clusters on Teflon and their work functions studied with X-ray photoelectron spectroscopy and ultraviolet photoelectron spectroscopy

Silicon species were deposited on tetrafluoroethylene Teflon.with pulsed laser silicon ablation at 532 nm under UHV. Surface species were studied with X-ray photoelectron spectroscopy XPS.and ultraviolet photoelectron spectroscopy UPS.. Tetrafluorocarbon CF4.was easily desorbed by the decomposition reaction of Teflon with flying silicon species. Surface species were characterized as a function of pulsed laser shots. Silicon species were terminated with oxygen in gas phase to form two kinds of SiO clusters x-0.3.in addition to oxygen terminated silicon networks. Their work functions x could be estimated by the shift of their Fermi energies. q1999 Elsevier Science B.V. All rights reserved