• Title of article

    Time-of-flight positron-annihilation induced Auger electron spectroscopy studies of adsorption of oxygen on Si 100/

  • Author/Authors

    Toshiyuki Ohdaira، نويسنده , , Ryoichi Suzuki، نويسنده , , Tomohisa Mikado، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 1999
  • Pages
    4
  • From page
    260
  • To page
    263
  • Abstract
    The initial stage of adsorption of oxygen on Si 100. was studied by the time-of-flight positron-annihilation induced Auger electron spectroscopy TOF-PAES.. The adsorption of oxygen on top of Si 100. was investigated by the real-time measurements of oxygen and Si PAES intensities during and after O2 exposure. It was found that the initial stage of the top-site adsorption depends strongly on surface temperature, and that the top-site adsorption state is not stable. q1999 Elsevier Science B.V. All rights reserved.
  • Keywords
    Auger electron spectroscopy , Positron spectroscopy , Oxygen , Silicon , Oxidation
  • Journal title
    Applied Surface Science
  • Serial Year
    1999
  • Journal title
    Applied Surface Science
  • Record number

    995746