Thermal behaviour of CorSirWrSi multilayers under rapid thermal annealing

The e-beam deposited multilayers MLS.were studied under rapid thermal annealing RTA.between 2508C and 10008C during 30 s. MLS with five CorSirWrSi periods, each 13.9 nm MLS1.and 18 nm MLS2.were deposited onto oxidized Si substrates. Samples were analyzed by X-ray diffraction, hard and soft X-ray reflectivity measurements and grazing incidence X-ray diffuse scattering. The MLS period, interface roughness and its lateral and vertical correlations were obtained by simulation of the hard X-ray reflectivity and diffuse scattering spectra. The MLS1 with thinner Co layers is more temperature resistant. However, its soft X-ray reflectivity is smaller. The results show that this is because of shorter lateral and vertical correlation lengths of the interface roughness which may considerably influence the X-ray reflectivity of multilayers. q1999 Elsevier Science B.V. All rights reserved