Title of article
On the reaction mechanism in laser-induced deposition of tungsten microstructures from WF rH 6 2
Author/Authors
K. Piglmayer، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2000
Pages
4
From page
365
To page
368
Abstract
Simultaneous and locally divided deposition and etching of W in WF6qH2 atmosphere is investigated by local
laser-induced heating of thin tungsten layers on quartz substrates. Model calculations based on reaction kinetics allow an
explanation of the different peculiarities of the depositionretching process. q2000 Elsevier Science B.V. All rights
reserved
Keywords
Tungsten microstructures , LCVD , deposition , Etching
Journal title
Applied Surface Science
Serial Year
2000
Journal title
Applied Surface Science
Record number
995941
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