Title of article
Amplification in light-induced reaction of Cu with Cl in the 2 VUV
Author/Authors
H. Raaf )، نويسنده , , Sandra M. Groen-Mulder، نويسنده , , G. Kaindl and N. Schwentner، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2000
Pages
6
From page
536
To page
541
Abstract
A non-selective light-induced reaction was observed in the spectral range from 135 to 120 nm due to electronic excitation
of Cl in the gas phase to the 1Sq and 212 u Squ states. It reaches a quantum efficiency of reacted Cu per impinging photon of
174 and the underlying amplification process has an efficiency of 4=106. A selective reaction dominates between 135 and
200 nm with two prominent bands at 170 and 144 nm. It originates from a bulk-excitation with a quantum efficiency of two
reacted atoms per photon. q2000 Elsevier Science B.V. All rights reserved.
Keywords
Dry etching , Photolithography , Microstructuring , synchrotron radiation , Cl2 , Cu
Journal title
Applied Surface Science
Serial Year
2000
Journal title
Applied Surface Science
Record number
995972
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