• Title of article

    Surface reaction mechanism in MOVPE growth of ZnSe revealed using radicals produced by photolysis of alkyl azide

  • Author/Authors

    Keiji Hayashi، نويسنده , , Akifumi Maeda، نويسنده , , Masataka Fujiyama، نويسنده , , Yoshiyasu Kitagawa، نويسنده , , Noriyuki Sakudo، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2000
  • Pages
    6
  • From page
    542
  • To page
    547
  • Abstract
    Epitaxial growth mechanism of ZnSe under alternate supply of diethylzinc DEZn.and dimethylselenium DMSe.was studied by in situ optical monitoring of the growing surface. When H2 was used as carrier gas, the time-dependent optical reflectance was found to exhibit a sawtooth pattern under DEZn supply. The sawtooth reflection signal was also observed in growth experiments using N2 carrier gas when DEZn was provided after supply of neutral free radicals produced by laser photolysis of alkyl azide. Based on these experimental results, microscopic mechanism of growth enhancement by coexistent H2 is discussed in terms of ab initio quantum chemistry. q2000 Elsevier Science B.V. All rights reserved.
  • Keywords
    Wide-bandgap semiconductor , Photodissociated-radical process , Azide , Insitu surface monitoring , Surface chemistry , Metalorganic epitaxial growth
  • Journal title
    Applied Surface Science
  • Serial Year
    2000
  • Journal title
    Applied Surface Science
  • Record number

    995973