Effects of carbon monoxide addition to chlorine plasma-treated platinum films

The effects of CO addition to platinum etching process using Cl2 plasma were investigated. X-ray photoelectron spectroscopy XPS.was used to determine the chemical binding state of the Pt surface treated with Cl2 plasma and CO. After CO treatment on the Pt pre-exposed to Cl2 plasma was carried out sequentially at 2408C, the ratio of Pt metal component, Pt 0., was increased significantly. The platinum chloride compounds on the Pt surface were removed vigorously by CO treatment at 2408C, which is above the sublimation temperature of Pt CO.2Cl2, i.e., 2108C. The scanning electron microscopy SEM.and atomic force microscopy AFM.results of the treated Pt film surfaces indicated that the volatile etching of Pt using Cl2rCO mixed gas plasma proceeded via the sublimation of Pt chloride compounds by means of CO. q2000 Elsevier Science B.V. All rights reserved