Title of article
The effect of different scanning schemes on target and film properties in pulsed laser deposition of bismuth
Author/Authors
A. Jacquot، نويسنده , , M.O. Boffoue´، نويسنده , , B. Lenoir، نويسنده , , A. Dauscher، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2000
Pages
8
From page
169
To page
176
Abstract
Thin bismuth films have been prepared on glass substrates at room temperature by pulsed laser deposition with a
Nd:YAG laser working at a wavelength of 532 nm. The influence of both target diameter and the way of scanning the laser
beam over the target surface on the film quality droplet density and film thickness homogeneity.was studied. Scanning
electron microscopy and thickness profile analyses were performed on the films. Three different laser beam scanning
schemes have been simulated and tested. Films of high quality are obtained using the highest possible target area eroded in
the most homogeneous way. This was achieved with an appropriate scanning of the laser beam over the target, for instance
with a ‘crenel’ like scanning or with a scanning at varying speed. Results are discussed in relation to target roughness.
q2000 Elsevier Science B.V. All rights reserved.
Keywords
SCANNING ELECTRON MICROSCOPY , Thickness profiles , Laser beam scanning , Bismuth , Pulsed laser deposition
Journal title
Applied Surface Science
Serial Year
2000
Journal title
Applied Surface Science
Record number
996020
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