Title of article
Self-assembled growth of InAs-quantum dots and postgrowth behavior studied by reflectance-difference spectroscopy
Author/Authors
T. Kita)، نويسنده , , K. Tachikawa، نويسنده , , H. Tango، نويسنده , , K. Yamashita، نويسنده , , T. Nishino and M. Takahashi ، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2000
Pages
5
From page
503
To page
507
Abstract
Initial stages of self-assembled growth of InAs dots on GaAs 001.and a postgrowth evolution of the deposited surface
have been investigated by reflectance-difference RD.spectroscopy and reflection high-energy electron diffraction RHEED..
A significant change in the RD spectrum occurs even at 0.1-monolayer ML.deposition of InAs. With increasing InAs
deposition, the As-dimer-elated RD sign is inverted, which indicates that the original As dimer along thew110xdirection of
the c 4=4.As-rich GaAs 001.surface becomes dimerized along thewy110xdirection. Postgrowth behavior has been
studied at 4808C after 1.9-ML deposition of InAs. During postgrowth, the As-dimer-related RD signal returns to signals
observed at lower InAs deposition. This behavior gives evidence that the InAs coverage is reduced by postgrowth.
Furthermore, positive offsets that increase in amplitude with photon energy appear in the RD spectra of the postgrown
samples. q2000 Elsevier Science B.V. All rights reserved.
Keywords
S–K growth , Wetting layer , quantum dots , RDS
Journal title
Applied Surface Science
Serial Year
2000
Journal title
Applied Surface Science
Record number
996216
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