Thermal characterization of CVD diamond film by photoacoustic method

The photoacoustic PA.method is useful for measuring the thermal characteristics of ultra-thin films, because it utilizes critical damping of thermal waves. The thermal characterization of a diamond film deposited by the chemical vapor deposition CVD.method was performed by using this method. We obtained the thermal image and measured the thermal conductivity in the vertical-depth direction of a diamond film deposited on silicon. The thermal conductivities for two samples 2 and 50 mm.were obtained as 396 and 639 W my1 Ky1, respectively. In addition, we measured the phase differences of the PA signal between Pq implanted diamond film and silicon, and non-implanted diamond film and silicon. Pq implanted film produced increases of the phase difference. These increases were not affected by a heat treatment at 10008C for 10 min. q2000 Elsevier Science B.V. All rights reserved.