Zn-vapor diffused Er:Yb:LiNbO channel waveguides fabricated 3 by means of SiO electron cyclotron resonance plasma deposition

We report here the fabrication method and operation of Zinc-vapor diffused channel waveguides on ErbiumrYtterbium ErrYb.-doped Lithium Niobate LiNbO3.. electron cyclotron resonance ECR.plasma deposition technique, UV pho- tolithography and Reactive Ion Etching RIE.are used to define an SiO2 mask for pattern transfer. The whole process is performed at low temperatures eliminating typical LiO2 out-diffusion problems and achieving low surface damage. The flexibility of the fabrication technology has been shown to be potentially applicable to integrated optics. EDAX measurements reveal good confinement and homogeneity of the diffused regions. Atomic Force Microscopy AFM.surface characterization shows the swelling of the diffused areas, consistent with the topoepitaxial growth of a Zn Li Nb O layer. x y z w q2000 Elsevier Science B.V. All rights reserved