• Title of article

    Sb-terminated Si 110/, Si 100/ and Si 111/ surfaces studied with high resolution core-level spectroscopy

  • Author/Authors

    A. Cricenti، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2000
  • Pages
    4
  • From page
    380
  • To page
    383
  • Abstract
    We report on synchrotron radiation photoelectron spectroscopy studies of the Si 2p core levels obtained with very high resolution from Sb overlayers onto the low-index silicon surfaces Si 110., Si 100. and Si 111.. The improved energy resolution of the third generation synchrotron radiation facilities has shown the presence of a strong interfacial component shifted 0.24, 0.2 and 0.13 eV, respectively, on the high binding energy side respect to the bulk peak. Such Si–Sb interface contribution is ascribed to charge transfer between the metal and the topmost silicon atoms and to the latest layers of silicon atoms distorted by the reconstruction from the ideal bulk position. A small component is always present on the high kinetic energy side and is presumably due to contribution from defects. q2000 Elsevier Science B.V. All rights reserved.
  • Keywords
    Silicon , Synchrotron photoelectron spectroscopy , Semiconducting surfaces
  • Journal title
    Applied Surface Science
  • Serial Year
    2000
  • Journal title
    Applied Surface Science
  • Record number

    996349