Title of article
XPS analysis of Pb Zr Ti /O thin film after dry-etching by 0.52 0.48 3 CHF plasma
Author/Authors
Yin-yin Lin، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2000
Pages
4
From page
34
To page
37
Abstract
The CHF3 plasma etched PbZr0.53Ti0.47O3 PZT.surface was chemically analyzed in order to investigate the dry-etching
machining process of PZT thin film. X-ray photoelectron spectroscopy XPS.results indicated that PbF2, ZrF4and polymer
containing C, H and F formed and remained on the etched surface during the dry-etching process while the Ti was almost
completely removed. The removal of the PbF2 was a key issue for getting a high etching rate. q2000 Published by Elsevier
Science B.V.
Keywords
PZT , Ferroelectric thin film , XPS
Journal title
Applied Surface Science
Serial Year
2000
Journal title
Applied Surface Science
Record number
996438
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