Morphology and microstructure of the Arq-ion sputtered 0001/ a-Al O surface

The morphology and microstructure of Arq-ion bombarded 0001. a-Al2O3 surfaces were studied by employing analytical electron microscopy AEM.and high-resolution transmission electron microscopy HRTEM.. Surface bombardment with 1 keV Arq-ions resulted in the formation of a ca. 3-nm thick g-Al2O3 layer with a high density of structural defects. A well-defined epitaxial orientation relationship between the g-Al2O3 layer and the substrate was observed: 0001.a I 111. ,w1010x Iw110x, andw1120x I"w112xg. q2000 Published by Elsevier Science B.V.