Title of article
Formation of the CorSi 111/7=7 interface: AES- and EELS-study
Author/Authors
N.I. Plusnin)، نويسنده , , A.P. Milenin، نويسنده , , D.P. Prihod’ko، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2000
Pages
5
From page
125
To page
129
Abstract
Formation of the CorSi 111.7=7 interface has been investigated by methods of electron energy loss spectroscopy
EELS.and Auger-electron spectroscopy AES.. The sequence of surface and thin-film phases at ds0–1, 2 and 3 ML, and
Co-terminated bulk phases CoSi2, CoSi, Co2Si.at ds4, 6–11, and 13–30 ML has been established. It has been shown
that the structure of phases at ds0–1 ML changes during annealing, while that at ds2 ML does not change. At d,3
ML, a phase extending on thickness with layered structure, which transforms into CoSi2 at T)4508C, has been detected.
This phase type grows in a wide composition range up to Co thickness of 11 ML under the layer-by-layer Co deposition and
annealing. q2000 Elsevier Science B.V. All rights reserved
Keywords
Cobalt , Single crystal surface , Surface chemical reaction , Auger-electron spectroscopy , Silicon , Electron energy loss spectroscopy
Journal title
Applied Surface Science
Serial Year
2000
Journal title
Applied Surface Science
Record number
996494
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