• Title of article

    Formation of the CorSi 111/7=7 interface: AES- and EELS-study

  • Author/Authors

    N.I. Plusnin)، نويسنده , , A.P. Milenin، نويسنده , , D.P. Prihod’ko، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2000
  • Pages
    5
  • From page
    125
  • To page
    129
  • Abstract
    Formation of the CorSi 111.7=7 interface has been investigated by methods of electron energy loss spectroscopy EELS.and Auger-electron spectroscopy AES.. The sequence of surface and thin-film phases at ds0–1, 2 and 3 ML, and Co-terminated bulk phases CoSi2, CoSi, Co2Si.at ds4, 6–11, and 13–30 ML has been established. It has been shown that the structure of phases at ds0–1 ML changes during annealing, while that at ds2 ML does not change. At d,3 ML, a phase extending on thickness with layered structure, which transforms into CoSi2 at T)4508C, has been detected. This phase type grows in a wide composition range up to Co thickness of 11 ML under the layer-by-layer Co deposition and annealing. q2000 Elsevier Science B.V. All rights reserved
  • Keywords
    Cobalt , Single crystal surface , Surface chemical reaction , Auger-electron spectroscopy , Silicon , Electron energy loss spectroscopy
  • Journal title
    Applied Surface Science
  • Serial Year
    2000
  • Journal title
    Applied Surface Science
  • Record number

    996494