Strain mapping of V-groove InGaAsrGaAs strained quantum wires using cross-sectional Atomic Force Microscopy

Cross-sectional Atomic Force Microscopy AFM.measurements in air combined with finite element FE.calculations are used to study the 110.cleaved surface of compressive InGaAsrGaAs quantum wells QWs.and V-groove quantum wires QWRs.. The elastic relaxation is clearly identified as the main cause of the AFM height contrast revealed on the cleaved edge. In particular, we show that the native oxidation due to the air exposure does not alter significantly the elastic deformation of the cleaved surface. This simple technique, which does not require any sample preparation or chemical etching, is applied to the characterization of the growth front evolution during the organometallic chemical vapor deposition growth on V-grooved substrates. Making use of the AFM surface profile measurements evidences the segregation of indium in the InGaAs film. q2000 Elsevier Science B.V. All rights reserved.