Title of article
Strained InAs nanostructures self-organised on high-index InP 113/B
Author/Authors
J. Brault، نويسنده , , M. Gendry، نويسنده , , G. Grenet، نويسنده , , A. Sole`re، نويسنده , , M. Phaner-Goutorbe، نويسنده , , Y. Robach، نويسنده , , L. Porte، نويسنده , , G. Hollinger، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2000
Pages
6
From page
326
To page
331
Abstract
We investigated self-assembled InAs islands grown on In0.52 Al0.48AsrInP 113.B by molecular beam epitaxy MBE.
using in-situ reflection high-energy electron diffraction RHEED.and in-situ scanning tunnelling microscopy STM.. For a
deposition of 3 monolayers MLs.of InAs, the STM topography revealed a high density of well-organised hexagonal
facetted dots. The dots are truncated height ;3 nm.and elongated along thew1 1 0xdirection. Their typical base
dimensions are approximately 48 and 19 nm. The angles between facet orientation and crystal direction were accurately
deduced from RHEED patterns. From these structural characterisations, the dot shape and formation mechanism are
discussed using a standard scheme based on surface energy minimisation. A direct correlation is found between the dot
shape and the surface reconstruction unit cell. q2000 Elsevier Science B.V. All rights reserved
Keywords
Molecular beam epitaxy , Strained InAs nanostructures , High-index InP 113.B
Journal title
Applied Surface Science
Serial Year
2000
Journal title
Applied Surface Science
Record number
996529
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