• Title of article

    Work function change caused by alkali ion sputtering of a sample surface

  • Author/Authors

    Yuriy Kudriavtsev )، نويسنده , , Rene Asomoza، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2000
  • Pages
    6
  • From page
    12
  • To page
    17
  • Abstract
    The steady state ion sputtering of a solid surface was studied. Based on a simple model, the surface concentration of ions implanted during sputtering was calculated in the case of cesium ion sputtering of silicon. The corresponding work function shift was calculated using the model developed. q2000 Published by Elsevier Science B.V.
  • Keywords
    Ion sputtering , Ion implantation , Work function
  • Journal title
    Applied Surface Science
  • Serial Year
    2000
  • Journal title
    Applied Surface Science
  • Record number

    996568

    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=10&DC=996568