Crystallinity of titania thin ®lms deposited by light induced chemical vapor deposition

Titanium dioxide thin ®lms were deposited from titanium tetraisopropoxide in an oxygen atmosphere by light induced chemical vapor deposition (LICVD), using a 308 nm XeCl excimer laser. We report on the in¯uence of substrate holder temperature at a low ¯uence (150 mJ/cm2) on the deposition on glass substrates. The growth rate follows an Arrhenius behavior between 120 and 2108C, corresponding to an activation energy of the deposition reaction of 20 kJ/mol. XRD and Raman spectroscopy detected a mixture of anatase and rutile crystals, possibly in an amorphous material. With increasing substrate temperature, the crystallinity is enhanced and the ratio, anatase/rutile increases. # 2000 Published by Elsevier Science B.V.