Excimer-laser induced chemical etching of transition metals

A photochemical etching system that allowed excimer-laser (193 nm) etching of various metals to be performed in an O2 atmosphere in the direct writing mode is described. Etch-rate measurements as a function of laser power and O2 partial pressure were obtained for a molybdenum rapid etching process, by the production of volatile metal oxides such as MoO3. Analysis of the etch rates revealed the in¯uence of oxygen partial pressure. Surface morphology studies using Tencor pro®lometry were undertaken to determine the results of the etching process. Post processing chemical treatment of samples was used to aid removal of surface debris. # 2000 Elsevier Science B.V. All rights reserved