• Title of article

    X-ray reflectivity studies of highly crystalline CeO2 films on (1 1 0 2) Al2O3

  • Author/Authors

    S.H Bang، نويسنده , , J.H Cho، نويسنده , , H.K. Kim ، نويسنده , , H.J. Cho، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2001
  • Pages
    4
  • From page
    257
  • To page
    260
  • Abstract
    We observed highly single crystalline epitaxial growth of CeO2 films on a (1 1 0 2) (r-cut) Al2O3 (sapphire) using X-ray reflectivity and diffraction. The X-ray reflectivity data indicate a presence of a thin interfacial layer between CeO2 film and r-cut sapphire with a lower electron density than that of CeO2. Above the interfacial layer, the mechanism of film growth deduced from the reflectivity and diffraction data indicates two-dimensional layer growth. The surface roughness of 394 Å thick film is 5 Å, and the film shows nearly strain-free growth.
  • Keywords
    Dielectric thin films , Interface structure and roughness , X-ray reflectivity
  • Journal title
    Applied Surface Science
  • Serial Year
    2001
  • Journal title
    Applied Surface Science
  • Record number

    996992