• Title of article

    XPS analysis of p-type Cu-doped CdS thin films

  • Author/Authors

    Takashi Abe، نويسنده , , Yasube Kashiwaba، نويسنده , , Mamoru Baba، نويسنده , , Jun Imai، نويسنده , , Hideyuki Sasaki، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2001
  • Pages
    6
  • From page
    549
  • To page
    554
  • Abstract
    X-ray photoelectron spectroscopy (XPS) was used to examine the chemical states and depth profiles of Cu, Cd and S in p-type Cu-doped CdS (CdS(Cu)) thin films. An Auger parameter was used to examine the chemical states of the elements. Auger parameters of Cu and Cd were similar to those of Cu2S and CdS, respectively. Therefore, it is thought that the doped Cu was Cu+ and Cd was Cd2+ in the CdS(Cu) films. Depth profiles of the elements in the CdS(Cu) films showed that the concentration of S was about 50% and constant, that Cu was diffused throughout the films, but rich at the surface and interface of CdS and the substrate, and that the concentration of Cd decreased with Cu doping, although the sum of the concentrations of Cd and Cu was also about 50%. Since Cu–S compounds such as Cu2S were not detected by XRD and EDX analyses using TEM in CdS(Cu) films. It is thought that the p-type characteristics of CdS(Cu) films are due to a Cu acceptor in which some of the Cd2+ are substituted by Cu+ in unit cells of CdS, not to the formation of p-type Cu–S compounds.
  • Keywords
    Cu-doping , Cu–S compounds , p-type , XPS , CdS thin film
  • Journal title
    Applied Surface Science
  • Serial Year
    2001
  • Journal title
    Applied Surface Science
  • Record number

    997090