Title of article
Quantum confinement effects in Si quantum well and dot structures fabricated from ultrathin silicon-on-insulator wafers
Author/Authors
Michiharu Tabe، نويسنده , , Minoru Kumezawa، نويسنده , , Yasuhiko Ishikawa، نويسنده , , Takeshi Mizuno، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2001
Pages
6
From page
613
To page
618
Abstract
Quantum confinement effects in two-dimensional (2D) Si and zero-dimensional (0D) Si structures, fabricated from silicon-on-insulator wafers, have been comparatively studied primarily by X-ray photoelectron spectroscopy (XPS), focusing on the energy shifts of the valence band maximum (VBM). As a result, it was found that the VBM obviously shifts toward higher binding energies during layer thinning of Si well and size reduction of Si dots, in accordance with quantum mechanical consideration.
Keywords
Quantum well , X-ray photoelectron spectroscopy , Valence band maximum , Silicon-on-insulator , Silicon , Quantum dot
Journal title
Applied Surface Science
Serial Year
2001
Journal title
Applied Surface Science
Record number
997100
Link To Document