Synthesis and characterization of nanoscaled and nanostructured carbon containing materials produced by thermal plasma technology

Single-walled carbon nanotubes (SWNT) and carbon nitride films are synthesized by a direct current (dc) arc discharge at slightly reduced pressure and by an inductively coupled r.f. plasma (ICP) at atmospheric pressure, respectively. By treatment with nitric acid SWNT are purified from by-products and characterized by scanning electron microscopy (SEM), high resolution transmission electron microscopy (HRTEM), and Raman spectroscopy. ICP allows the deposition of carbon nitride films on steel substrate. The deposition of the films creates a relatively strong radial symmetric profile. The structure of the films are rather independent of the distance between substrate and plasma. Raman, Fourier transform infrared (FTIR), and energy dispersive X-ray (EDX) spectroscopy are used for analyzing the carbon nitride materials.