Title of article
Thermally evaporated aluminium thin films
Author/Authors
N.G. Semaltianos، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2001
Pages
7
From page
223
To page
229
Abstract
Aluminium thin films were grown on quartz substrates by metal thermal evaporation, with thicknesses between 18 and 100 nm and evaporation rates from 1 to 20 Å/s. The surface morphology of the films was examined by atomic force microscopy imaging and cross-compared. The change of the estimated surface roughness with film thickness and evaporation rate was investigated and discussed. The optical transmission of the films was measured from 200 to 800 nm and correlated to the corresponding surface morphology as determined by the film thickness and evaporation rate. The goal is to optimize the use of thermally evaporated aluminium films as semitransparent electrodes in fast photoconduction experiments involving molecular stacks of discotic liquid crystals.
Keywords
Aluminium thin films , Photoconduction , atomic force microscopy , Structure and morphology-thickness , Nucleation , Thin films , Optical properties
Journal title
Applied Surface Science
Serial Year
2001
Journal title
Applied Surface Science
Record number
997410
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