Title of article
Correlation between the carbon and hydrogen contents with the gas species and the plasma impedance of silicon carbide films produced by PECVD technique
Author/Authors
R. Martins، نويسنده , , V. Silva، نويسنده , , H. ?guas، نويسنده , , A. Cabrita، نويسنده , , I. Ferreira، نويسنده , , E. Fortunato، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2001
Pages
6
From page
101
To page
106
Abstract
R. Martins, V. Silva, H. Águas, A. Cabrita, I. Ferreira, E. Fortunato
Keywords
Plasma diagnostics , Plasma impedance , Amorphous silicon carbide
Journal title
Applied Surface Science
Serial Year
2001
Journal title
Applied Surface Science
Record number
997447
Link To Document