Title of article
A Monte Carlo study of low field transport in Al-doped 4H–SiC
Author/Authors
A. Martinez، نويسنده , , U. Lindefelt، نويسنده , , M. Hjelm، نويسنده , , H.-E. Nilsson، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2001
Pages
5
From page
173
To page
177
Abstract
The ohmic transport of holes in p-type aluminum-doped 4H–SiC samples is investigated using a Monte Carlo (MC) tool based on a full-potential band structure. The temperature and doping dependence of the hole mobility and its anisotropy are calculated and discussed from a physical point of view, where we stress the importance of considering two-band conduction. Acoustic and optical phonon scattering, as well as ionized and neutral impurity scattering, have been considered. The MC program considers incomplete ionization of impurity atoms, and we assume an impurity level with the ionization energy 0.2 eV, corresponding to Al-doped samples.
Keywords
Monte Carlo simulation , 4H–SiC , anisotropy , Mobility
Journal title
Applied Surface Science
Serial Year
2001
Journal title
Applied Surface Science
Record number
997457
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