• Title of article

    In situ RHEED monitor of the growth of epitaxial anatase TiO2 thin films

  • Author/Authors

    In situ RHEED monitor of the growth of epitaxial anatase TiO2 thin films Original Research Article Pages 47-51 C.K. Ong، نويسنده , , S.J. Wang، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2001
  • Pages
    5
  • From page
    47
  • To page
    51
  • Abstract
    Epitaxial anatase TiO2 thin films were successfully grown on (0 0 1) SrTiO3 substrates by the laser molecular-beam epitaxy (laser-MBE) method. The whole growth process is monitored by in situ reflection high-energy electron diffraction (RHEED). RHEED monitoring shows a transition from a streaky pattern to a spot pattern during deposition, indicating different growth modes of TiO2 film. The RHEED patterns are in consistent with the RHEED intensity oscillation results. The atomic force microscopy (AFM) and X-ray diffraction (XRD) investigation show that the thin films have single crystalline orientation with roughness less than three unit cells.
  • Keywords
    Laser deposition , Surfaces and interfaces , Reflection high-energy electron diffraction , Dielectric thin films
  • Journal title
    Applied Surface Science
  • Serial Year
    2001
  • Journal title
    Applied Surface Science
  • Record number

    997508