• Title of article

    Influence of interface structures on Sn thin film growth on Si(1 1 1) surface

  • Author/Authors

    J.T. Ryu، نويسنده , , T. Fujino، نويسنده , , M. Katayama، نويسنده , , Y.B. Kim، نويسنده , , K. Oura، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2002
  • Pages
    5
  • From page
    139
  • To page
    143
  • Abstract
    Using coaxial impact collision ion scattering spectroscopy, we have investigated Sn thin film growth on Si(1 1 1)√3×√3-Sn and hydrogen-terminated Si(1 1 1) surfaces at room temperature. Sn formed crystalline film with β-Sn structure on Si(1 1 1)√3×√3-Sn surface, but on the hydrogen-terminated Si(1 1 1) surface, the epitaxial growth of Sn thin film was disrupted, and Sn grew as a polycrystalline film. The growth orientational relationship of the Sn film grown on Si(1 1 1)√3×√3-Sn surface was found to be Sn(1 0 0)〈0 1 0〉//Si(1 1 1)〈0 1̄ 1〉. In the works, we found that interface structure plays a decisive role for the growth mode, crystallinity, and growth orientation of the growth of thin film.
  • Keywords
    Epitaxial growth , Interface , Ion scattering spectroscopy , Si(1 1 1) , CAICISS , ?3×?3-Sn structure , Hydrogen termination , Sn
  • Journal title
    Applied Surface Science
  • Serial Year
    2002
  • Journal title
    Applied Surface Science
  • Record number

    997847