The surface modification of Dow Cyclotene by low energy N2+ beams and its effect on the adhesion of evaporated Cu films

Low energy (3–6 keV) N2+ beams have been used to modify Dow Cyclotene for the purpose of grafting N-containing groups onto the Cyclotene surface. In situ XPS analysis demonstrated an extensive loss of aromaticity due to bond breaking by the beam, while angle resolution showed that implantation occurred substantially below the Cyclotene surface. The paucity of N-containing groups at the outer surface and the resultant poor adhesion of the Cu clusters permitted extensive cluster coalescence.