• Title of article

    The unimolecular decay of Aln± and Sin± sputtered clusters

  • Author/Authors

    N.Kh. Dzhemilev، نويسنده , , A.D. Bekkerman، نويسنده , , S.E. Maksimov، نويسنده , , V.I. Tugushev، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2003
  • Pages
    4
  • From page
    118
  • To page
    121
  • Abstract
    The decay processes of Aln± (n=2–24) and Sin± (n=2–12) clusters sputtered from Al, Si targets under Xe+ and Cs+ ion bombardment have been studied. We have determined the most probable fragmentation channels of positively and negatively charged clusters in the acceleration zone of tool in time region of 10−9 to 10−7 s from the emission moment and in the field-free zones of the apparatus in the time interval of 5×10−7 to 5×10−5 s. The intensive fragmentation of Aln+ and Sin+ occurs with Al+ and Si+ formation. It permits to make a conclusion, that one part of Al+ and Si+ ions on the detector corresponds to “true” secondary ions, while another part is due to cluster decays and corresponds to the fragments.
  • Keywords
    Cluster , Silicon , Sputtering , Aluminiun , Fragmentation , Ions
  • Journal title
    Applied Surface Science
  • Serial Year
    2003
  • Journal title
    Applied Surface Science
  • Record number

    998402