Title of article
On the non-linear I–V characteristics of dc magnetron sputtered TiO2 thin films
Author/Authors
Marius D. Stamate، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2003
Pages
5
From page
353
To page
357
Abstract
In this paper, we have studied the static current–voltage characteristics for TiO2 thin films deposited by a dc magnetron sputtered method. We have studied the non-linear characteristics for TiO2 films prepared in sandwich structures (aluminum–TiO2–aluminum), on microscopic slide glass. We have found that the trap density is lower for films with larger thicknesses. We have calculated the carrier effective mass and the high of the barrier potential at an aluminum–TiO2 interface and we found that the TiO2 films are corresponding to an anatase polycrystalline structure of TiO2 films.
Keywords
Magnetron , Thin films , TiO2 thin films , Magnetron sputtering , TiO2 , dc electrical properties
Journal title
Applied Surface Science
Serial Year
2003
Journal title
Applied Surface Science
Record number
998516
Link To Document