Experiment combining ion-beam sputtering and quantitative ICP-OES analysis: angular distributions and total yield of titanium sputtered by 5 keV krypton ions

A polycrystalline Ti target is submitted to the impact of a 5 keV krypton ion beam at near normal (6 18) incidence. The sputtered material is collected on a MylarTM cylindrical foil surrounding the target. Angularly resolved data on the amount of sputtered Ti are obtained by dissolving the deposits on small squares cut out from the foil and analysing these quantitatively by inductively coupled plasma optical emission spectroscopy (ICP-OES). The angular distributions in two perpendicular directions are rather close to calculated distributions based on a cosine law or obtained from SRIM simulations. A sputtering yield of 2:3 0:2 is found. The overall sticking coefficient of sputtered Ti on the foil is close to unity. # 2003 Elsevier B.V. All rights reserved