• Title of article

    Advanced study of various characteristics found in RHEED patterns during the growth of InAs quantum dots on GaAs (0 0 1) substrate by molecular beam epitaxy

  • Author/Authors

    J.W. Lee*، نويسنده , , D. Schuh، نويسنده , , M. Bichler، نويسنده , , G. Abstreiter، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2004
  • Pages
    7
  • From page
    306
  • To page
    312
  • Abstract
    Various characteristics of RHEED patterns were examined with respect to geometrical and crystallographic point of views including chevron patterns frequently found after the growth of self-assembled InAs quantum dots, streak lines and Laue circles from GaAs wafer surface. These three patterns offer clear understanding of surface morphology change during or after dot growth. Various patterns and geometrical relationship between those patterns, coupled with specific surface reconstruction structures of GaAs (0 0 1) surface were studied. # 2004 Elsevier B.V. All rights reserved.
  • Keywords
    Reflection high energy electron diffraction , Molecular beam epitaxy , Nanomaterials
  • Journal title
    Applied Surface Science
  • Serial Year
    2004
  • Journal title
    Applied Surface Science
  • Record number

    999435