Title of article
Advanced study of various characteristics found in RHEED patterns during the growth of InAs quantum dots on GaAs (0 0 1) substrate by molecular beam epitaxy
Author/Authors
J.W. Lee*، نويسنده , , D. Schuh، نويسنده , , M. Bichler، نويسنده , , G. Abstreiter، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2004
Pages
7
From page
306
To page
312
Abstract
Various characteristics of RHEED patterns were examined with respect to geometrical and crystallographic point of views
including chevron patterns frequently found after the growth of self-assembled InAs quantum dots, streak lines and Laue circles
from GaAs wafer surface. These three patterns offer clear understanding of surface morphology change during or after dot
growth. Various patterns and geometrical relationship between those patterns, coupled with specific surface reconstruction
structures of GaAs (0 0 1) surface were studied.
# 2004 Elsevier B.V. All rights reserved.
Keywords
Reflection high energy electron diffraction , Molecular beam epitaxy , Nanomaterials
Journal title
Applied Surface Science
Serial Year
2004
Journal title
Applied Surface Science
Record number
999435
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