• DocumentCode
    10186
  • Title

    Interface reactions during processing of chemical vapor deposited yttrium oxide high-k dielectrics

  • Author

    Gregory N. Parsons استاد راهنما , Gerald Lucovsky استاد مشاور , Veena Misra استاد مشاور , H. Henry Lamb استاد مشاور

  • University
    Raleigh North carolina state university
  • Grade
    نامعلوم
  • Major
    PhD )Chemical Engineering(
  • Number of pages
    0
  • Publish Date
    2002
  • Keyword

    Interface reaction mechanisms , High-k gate dielectrics , CVD , Yttrium Oxide

  • Note
    01
  • Language
    انگليسي
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=17&DC=10186