DocumentCode
15436
Title
SOME CHEMICAL AND ELECTROCHEMICAL ASPECTS OF THE CHEMICAL MECHANICAL POLISHING OF COPPER
Author
Barbara A. Shaw استاد مشاور , Howard W. Pickering استاد مشاور , Tarasankar DebRoy استاد مشاور , Kwadwo Osseo-Asare استاد راهنما
University
The Pennsylvania State University
Grade
نامعلوم
Major
PhD )Materials Science and Engineering(
Number of pages
0
Publish Date
2002
Keyword
CMP , chemical mechanical polishing , benzotriazoe , BTA , hydroxylamine , Copper , bare metal , Hydrogen peroxide
Note
01
Language
انگليسي
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