DocumentCode
2810
Title
Effects of implementation of decaborane ions in silicon
Author
Chin Ken K. استاد مشاور , Sosnowski Marek استاد راهنما
University
Van Houten Library )new Jersey Institute Of Technology(
Grade
دكتري
Major
Doctor of Philosophy )Materials Science and Engineering(
Number of pages
0
Publish Date
2003
Keyword
decaborane , Implantation , MD simulation , cluster ions , sputtering yield , TED
Note
01
Language
انگليسي
Link To Document