DocumentCode
4092
Title
Development of Inorganic Resists for Electron Beam Lithography: Novel Materials and Simulations
Author
Clifford L. Henderson استاد راهنما , Brent Carter استاد مشاور , Dennis Hess استاد مشاور
University
Georgia Institute Of Technology
Grade
دكتري
Major
Doctor of Philosophy
Number of pages
0
Publish Date
2004
Keyword
Lithography , Monte Carlo simulation , Metal-organic , electron beam , inorganic , Resist
Note
01
Language
انگليسي
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