Structural characterization of Magnetron Sputtered ZnO thin films

The effects of increasing Magnetic Field on the structure of ZnO films, during its’ preparing by Magnetron sputtering method, is studied using XRD. Three peaks of (100 ), (002) and (101) orientations are appeared in X ray chart indicating the polycrystalline nature of the films, from this chart it is seen that, the dominant orientation of ZnO films is (002). All the peaks have large broadening due to relatively small values of Grain size (175، 5(Å) ±38، 5) and the strains inside films. The results of increasing Magnetic Field between 220 and 570 Gauss are: Increasing the intensities of all peaks and Fluctuations in values of Grain size, Stress, Energy gaps and Strain