Structural characterization of Magnetron SputteredZnO:In thin films

The effects of increasing sputtering time on the structure of ZnO:In films are studied. XRD ray test illustrates the dependence of preferred orientation and the diffraction peak intensities on the sputtering time. From texture coefficient measurements the preferred orientation of ZnO:In films is (002) plane. SEM photographs are used to calculate films thicknesses. Grain sizes and films thicknesses were found to increased with increasing sputtering time. The tensile stresses found in all films were due to decrement of the c-axis values, and the strain in the plane of each film increases with increasing sputtering time.