Electrophoretic deposition of uniform graphene oxide thin film on porous silicon substrate

In present work, a uniform thin film of graphene oxide (GO) was deposited on porous silicon (PS) substrate. GO was successfully synthesized using the modified Hummer’s method and was efficiently deposited onto photo-electrochemically etched PS substrate using electrophoretic deposition (EPD) technique. The morphology and structural properties of synthesized and deposited layer was investigated using field emission scanning electron microscopy and Raman spectroscopy. The results showed that high surface area of porous structure facilitated deposition of GO. Thus, a uniform and high quality thin film of GO was deposited on PS substrate.